SE-1000 Spectroscopic Ellipsometer
A cost-efficient, high-performance tabletop solution for advanced spectroscopic ellipsometry. Engineered for R&D excellence, providing non-contact and non-destructive optical characterization for substrates, single-layer, and multi-layer thin film structures.
Product Overview
The SE-1000 provides modularity and high measurement performance in a compact tabletop footprint. This tool includes a manual goniometer and manual sample positioning, making it ideal for R&D laboratories.
Key Specifications
| System Parameters | |
|---|---|
| Footprint | Compact Tabletop Manual System |
| Hardware | Manual Goniometer & Sample Stage |
| Electronics | Smart Interchangeable Components |
| Software | Next-Gen SAM/SEA Suite |
| Connectivity | PC/Laptop via LAN Network |
| Interface | Optional Touch Panel Interface |
Core System Features
Utilizes rotating compensator technology to achieve high-precision spectroscopic measurements on a wide range of materials.
Supports Generalized Ellipsometry for anisotropic samples, providing detailed structural insights that standard tools miss.
Measures Mueller matrix (11 coefficients) and Jones matrix for complete polarimetric characterization of thin films.
Features modular smart electronics, allowing for easy maintenance and future-proof component swaps as technology evolves.
Determines pore size distribution and total porosity in thin films, a critical capability for advanced material science.
Equipped with a real-time measurement mode for active control during deposition or etching processes.
Technical Specifications
| Technical Parameter | Specification Detail |
|---|---|
| Measurement Technology | Spectroscopic Ellipsometry with rotating compensator |
| Goniometer Type | Manual adjustment for Angle of Incidence (AOI) |
| Sample Stage | Manual X-Y sample positioning for R&D flexibility |
| System Architecture | Modular Smart Electronics with interchangeable parts |
| Operating System | New generation SAM/SEA analysis software suite |
| Control Interface | PC control via LAN or Integrated Touch Panel |
| Matrix Support | Mueller matrix (11 coefficients) and Jones matrix |
| Extracted Values | Thickness, Refractive Index (n), Extinction Coefficient (k) |
| Real-time Control | In situ measurement mode for process monitoring |
| Spectral Range | Optional Near-infrared (NIR) spectral extension |
Primary Applications



Thin Film Metrology
Precise determination of film thickness and complex optical constants for research-grade semiconductor materials.
Porosimetry Analysis
Measurement of pore size distribution and total porosity in advanced thin-film structures for energy and filtration research.
In Situ Monitoring
Real-time measurement and control during deposition or etch processes to ensure process consistency and precision.





