eVerest® RF Generator – Next-Generation Plasma Control for Advanced Semiconductor Processing

The eVerest® RF Generator is engineered for the semiconductor industry’s next technology node, delivering transformative plasma control through configurable multi-level pulsing, high-speed model-based frequency tuning, and intelligent IoT-enabled performance insights. With unmatched responsiveness, stability, and process adaptability, eVerest empowers innovation for sub-2 nm etch and deposition applications.

Key Features

• Full RF delivery system with multiple matching solutions and intelligent synchronization

• Programmable multi-level pulse profiles for superior speed and control

• High-speed RF output response with fast rise/fall pulse transitions

• Wide frequency tuning range up to ±10% for enhanced process stability

• Designed-in dP/dZ stability for reliable operation

• Integrated PowerInsight™ IoT intelligence for advanced diagnostics and optimization

Benefits

• Enables next-generation process development for <2 nm deposition and etch

• Provides reliable plasma ignition and RF stability independent of cable length

• Seamlessly integrates into new and existing plasma platforms

• Expands process space and widens stability windows

• Supported globally with extensive applications and service resources

Specifications

• Cooling: Water

• Output Frequency: 1–65 MHz

• Input Voltage: 200/240 VAC or 400–480 VAC

• Power Levels: 3–10 kW

• Rack Width: Half rack or full rack

• Height: 3U

• Interfaces: EtherCAT, Ethernet, RS-232, DeviceNet

• Advanced Features: Multi-level pulsing, arc management, CEX, MBFT

• Applications: Etch, PECVD, PVD, Chamber Clean, HDP-CVD, PEALD, ALE