Small and compact, suitable for R&D purposes
Features of Plasma Cleaner (Parallel Electrode, Compact) (PiPi)
- Small and compact, suitable for R&D purposes
- Compact design, RIE (Reactive Ion Etching) mode
- Economical plasma cleaning machine
- Simple plasma processing operation
- Among the plasmatized gases, in addition to ions and electrons, there are electrically neutral atoms and molecules that electrons have moved to the electrical excitation.
- By sputtering effect by ions, it is possible to remove not only organic matter on the surface of the object but also inorganic matter.
Specifications
| Item Code | 00 |
|---|---|
| Model | PiPi |
| Model | PiPi |
| Plasma mode | RIE (reactive ion etching) |
| Electrode structure | Parallel flat panel type |
| Electrode dimensions | W130×D130mm |
| Internal dmensions | W230×D130×H100mm |
| External dimensions | W438×D520×H565mm |
| Power source (50/60Hz) | AC115V/AC220V Single phase with step-down transformer |
| Vacuum meter | Bourdon gauge |
| Controller | Sequencer |
| Operation/display unit | 4.5-inch monochrome STN touch panel |
| High-frequency out-put power | 50-200W |
| Reference oscillator | Quarts oscillator |
| Oscillation frequency | 13.56MHz |
| Output setting | Manual setting knob |
| Matching method | Auto tuning |
| Purge gas | N2 1/4-inch bite type tube fitting |
| Reaction gas | Ar mass flow meter 1/4-inch bite type tube fitting |
| Internal dimensions（W×D×H mm） | 230×130×100mm |
| External dimensions（W×D×H mm） | 438×520×565mm |
| Power Source |
115V /220V Single phase with step-down transformer |
| Weight | 50kg |
Maintenance and warranty
Conditions: temperature and humidity: 23 deg.C+/-5 deg.C, 65%RH+/-20% (no load)
External dimensions do not include protrusions.
BR 19104 
US 11513 
VN 6683 
CN 2699 
TR 2356 
AU 1786 
CA 1768 
TH 1657 
